HOME
Full Articles List
Search by Author
Title: MORPHOLOGICAL AND STRUCTURAL CHARACTERIZATION OF THIN LAYERS OF TIN COATED ON THE SILICON SUBSTRATE
BibTex 
Open this article in the author's DB |
|
MORPHOLOGICAL AND STRUCTURAL CHARACTERIZATION OF THIN LAYERS OF TIN COATED ON THE SILICON SUBSTRATE
|
|
|
|
|
|
|
|
||
|
|
|
|
|
|
1314-2704
|
|
|
|
||
|
|
English
|
|
|
|
18
|
|
|
|
6.1
|
|
|
|
|
|
|
|
||
|
|
Morphological and structural characterisations were carried out on the layers of TiN
lodged on the silicon substrate with orientation (100). The analysis of the crystalline structure of TiN films was performed by X-ray diffraction (XRD), using a diffractometer high resolution, using radiation Mo K? . The Atomic Force Microscopy Analysis (AFM) has followed the assessment of the influence of important parameters of the filing process (temperature, polarity of the substrate) on the surface morphology and the roughness of TiN films. The bulge test was first conducted on the silicon nitride films to determine its proper residual stress and Young, s modulus which were found to be ?i = 228 + 15 MPa and E = 226 + 10 GPa , respectively. Finally, using a simple rule of mixture formula ,the elastic mechanical properties of TiN coatings were determined . Both the Young, s modulus and residual stress showed increasing values with bias voltage, nitrogen to titanium ratio, and coating density. Scanning electron microscopy of cross sectioned samples showed that coating growth occurs by formation of equiaxial crystallites, which leads to columnar morphology beyond a thickness of 3 ? 10 ?m . The columns are nearly perpendicular to the film surface . |
|
|
|
conference
|
|
|
|
||
|
|
||
|
|
18th International Multidisciplinary Scientific GeoConference SGEM 2018
|
|
|
|
18th International Multidisciplinary Scientific GeoConference SGEM 2018, 02-08 July, 2018
|
|
|
|
Proceedings Paper
|
|
|
|
STEF92 Technology
|
|
|
|
International Multidisciplinary Scientific GeoConference-SGEM
|
|
|
|
Bulgarian Acad Sci; Acad Sci Czech Republ; Latvian Acad Sci; Polish Acad Sci; Russian Acad Sci; Serbian Acad Sci & Arts; Slovak Acad Sci; Natl Acad Sci Ukraine; Natl Acad Sci Armenia; Sci Council Japan; World Acad Sci; European Acad Sci, Arts & Letters; Ac
|
|
|
|
299-306
|
|
|
|
02-08 July, 2018
|
|
|
|
website
|
|
|
|
cdrom
|
|
|
|
1807
|
|
|
|
thickness; silicon substrate; TiN films; roughness; equiaxial crystallites
|
|
Download PDF