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NANOSTRUCTURED SILICON FOR SOLAR CELLS
Abstract
Nanostructured black silicon wafers were obtained in a two-stage process of selective chemical etching initiated by metal nanoclusters. The obtained silicon wafer surfaces demonstrate the reflectance of 2-3% in the visible range. Surface-enhanced Raman scattering (SERS) effect was observed on silicon substrates coated with silver or cooper nanoclusters. Test substance of Rhodamine can be detected up to concentration of ~10- 12 ? by using nanostructured silicon substrates covered with silver nanoparticles. Dependence of average thickness of nanoparticles layer after the first stage of treatment as well as the thickness of the structured layer after the second stage of treatment on the concentration of AgNO3 in the solution was determined. It was shown that the depth of the structured layer is linearly dependent on the duration of the second stage etching up to etching time about 100 seconds. During the etching process, the formation rate of textured layer is twice faster in p-type silicon than in n-type silicon.
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