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Morphological and structural characterisations were carried out on the layers of TiN lodged on the silicon substrate with orientation (100). The analysis of the crystalline structure of TiN films was performed by X-ray diffraction (XRD), using a diffractometer high resolution, using radiation Mo K? . The Atomic Force Microscopy Analysis (AFM) has followed the assessment of the influence of important parameters of the filing process (temperature, polarity of the substrate) on the surface morphology and the roughnes...

In this paper, thin films TiCx was coated by chemical vapour deposition method, and various duty cycles were carried out in order to observe the influence of this parameter on residual stress and tribology behaviours. The duty cycles were 35, 43 and 50% at 500uC operating temperature. Therefore, wear behaviour, hardness and chemical analyses of TiCx coating were characterised, and it was found that the residual stresses in the coating were compressive, which were- 1.4189, - 0.2985 and -0.1749 MPa at three differen...