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FABRICATION OF A REFLECTING MEMS-ELEMENT BASED ON A THERMAL MICROMECHANICAL ACTUATOR

Ph.D. Sergei Evstafev, Prof. Sergey Timoshenkov, Prof. Vyacheslav Samoilykov, Prof. Natalia Korobova

Abstract

Based on a previous research, a thermal bimorph actuator was used for a development of a micromirror element. An existing technological process for the manufacturing of IC was used as base for micromirror. An analysis of the available construction materials was made, on the basis of which a choice was made for silicon as the main material for the micromirror, aluminum as the reflective coating and the first element of the bimorph beam, and silicon dioxide as the second element of the bimorph beam. ? polysilicon heater is used for heating. Based on these materials, the design and topology of the micromirror element was created with dimensions of the reflecting surface of 50x50 and 100x100 ?m. The technological manufacturing process of a micromirror includes 7 main stages: preparation of a silicon wafer, oxidation, a creation of a heating element, insulation of a heating element, opening of contact windows, aluminum deposition and final etching of a micromirror element. Of all the operations listed above are usual for an IC fabrication, with the exception of the last one, which is an isotropic plasmachemical etching up to a depth of 30-50 ?m. Using the proposed technological process, test micromirror elements have been manufactured and successfully tested.

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DOI resolver: doi.org/10.5593/sgem2017/61/s24.018

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